DOI: 10.22184/1993-7296.FRos.2025.19.8.634.640

This article proposes a common concept for an industrial ellipsometer designed to control the film thickness of functional and auxiliary layers being the basis of integrated circuit designs. The optical design of the ellipsometer with mirror lenses and an experimental study of the mirror optics are described. The mathematical modeling is supported by experimental data.

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Разработка: студия Green Art