rus
Issue #4/2025
A. I. Arzhanov, A. S. Shelkovnikov, V. V. Shulga, K. E. Aleksashin, A. O. Kolesnikov, A. N. Shatokhin, E. N. Ragozin, A. V. Naumov
Stamp Electron-Beam Nanolithography as a Tool for Fabricating Aperiodic Diffraction Gratings for X-ray Optics
Stamp Electron-Beam Nanolithography as a Tool for Fabricating Aperiodic Diffraction Gratings for X-ray Optics
DOI: 10.22184/1993-7296.FRos.2025.19.4.292.295
The results of fabrication and characterization of metallized aperiodic diffraction gratings (with a line density ranging from 150 to 570 lines per mm) using modernized scanning stamp
electron-beam nanolithography machine ZBA-21 with a 200 nm process technological standard and a working area of up to 150× 150 mm are presented. The characterization was performed
using scanning atomic force microscopy.
Subscribe to the journal Photonics Russia to read the full article.
The results of fabrication and characterization of metallized aperiodic diffraction gratings (with a line density ranging from 150 to 570 lines per mm) using modernized scanning stamp
electron-beam nanolithography machine ZBA-21 with a 200 nm process technological standard and a working area of up to 150× 150 mm are presented. The characterization was performed
using scanning atomic force microscopy.
Subscribe to the journal Photonics Russia to read the full article.
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