rus
Issue #4/2025
A. I. Arzhanov, A. S. Shelkovnikov, V. V. Shulga, K. E. Aleksashin, A. O. Kolesnikov, A. N. Shatokhin, E. N. Ragozin, A. V. Naumov
Stamp Electron-Beam Nanolithography as a Tool for Fabricating Aperiodic Diffraction Gratings for X-ray Optics
Stamp Electron-Beam Nanolithography as a Tool for Fabricating Aperiodic Diffraction Gratings for X-ray Optics
DOI: 10.22184/1993-7296.FRos.2025.19.4.292.295
The results of fabrication and characterization of metallized aperiodic diffraction gratings (with a line density ranging from 150 to 570 lines per mm) using modernized scanning stamp
electron-beam nanolithography machine ZBA-21 with a 200 nm process technological standard and a working area of up to 150× 150 mm are presented. The characterization was performed
using scanning atomic force microscopy.
The results of fabrication and characterization of metallized aperiodic diffraction gratings (with a line density ranging from 150 to 570 lines per mm) using modernized scanning stamp
electron-beam nanolithography machine ZBA-21 with a 200 nm process technological standard and a working area of up to 150× 150 mm are presented. The characterization was performed
using scanning atomic force microscopy.
Stamp Electron-beam Nanolithography
as a Tool for Fabricating
Aperiodic Diffraction Gratings
for X-ray Optics
A. I. Arzhanov 1, 2, A. S. Shelkovnikov 1, V. V. Shulga 1, K. E. Aleksashin 1, A. O. Kolesnikov 1, A. N. Shatokhin 1, E. N. Ragozin 1, A. V. Naumov 1, 2
P. N. Lebedev Physical Institute of the Russian Academy of Sciences, Moscow, Troitsk, Russia
Moscow Pedagogical State University (MPGU), Moscow, Russia
The results of fabrication and characterization of metallized aperiodic diffraction gratings (with a line density ranging from 150 to 570 lines per mm) using modernized scanning stamp electron-beam nanolithography machine ZBA‑21 with a 200 nm process technological standard and a working area of up to 150 × 150 mm are presented. The characterization was performed using scanning atomic force microscopy.
Кeywords: Diffractive optics, X-ray optics, stamp electron-beam nanolithography, aperiodic diffraction gratings
Article received: 16.06.2025
Article accepted: 22.06.2025
Diffractive optics (DO) is one of the key areas of modern photonics, studying light control through micro- and nanostructures that induce diffraction. DO enables the creation of compact and highly efficient optical elements such as zone plates, holograms, and metasurfaces, which surpass traditional refractive optics. These technologies are applied in microscopy, lithography, laser systems, and optical communications. Of particular interest are metamaterials that showcasing unique effects, such as negative refraction [1]. The most important applications of DO include spectroscopy, microscopy, adaptive technologies, holographic elements, imaging systems, and X-ray optics [2].
One of the most in-demand applications of DO remains the production of diffraction gratings, especially in the context of emerging methods for designing diffractive optical elements and expanding the technology to various spectral ranges. Particularly important is the X-ray range, which requires the fabrication of grazing-incidence optics, including those based on aperiodic diffraction gratings [3].
Electron-beam nanolithography can be a highly efficient method for creating such diffractive elements [4].
In this note, we demonstrate a synthesized diffraction grating with potential applications in X-ray optics. The sample consists of a 5×5‑inch glass plate coated with a 160 nm chromium layer. At the center of the plate is the working area of a VLS grating (varied line space grating) for a soft x-ray monochromator (90–200 Å), mesauring 60 mm (width) × 10 mm (height). The line density ranges from 150 to 570 lines/mm, and the variation along the grating’s aperture is determined by a specific rule. The grating was fabricated using a ZBA‑21 electron-beam nanolithography system, which enables the creation of structures with a 200 nm process standard on surfaces up to 178×178 mm in size. Currently, this system is undergoing modernization at the Troitsk Branch of the P. N. Lebedev Physical Institute. A distinctive feature of this hardware complex is its stamp-based electron-beam formation method and high-precision alignment of individual elements of the lithographed structure, achieved using advanced laser interferometry techniques.
After exposure to the electron beam, the resist was developed, the underlying chromium layer was etched, the residual resist was removed, and the final product was cleaned. The total number of lines in the grating exceeds 19,000, with a smoothly varying period along the long side of the sample.
The initial characterization of the fabricated grating was performed at the Laboratory of Advanced Materials and Nanostructures Physics, Moscow State Pedagogical University, using an NTegra atomic force microscope (manufactured by Active Photonics, Russia), providing spatial resolution on the order of a few nanometers [4]. Figure 1 shows fragments of the topography of the lithographically fabricated VLS grating. Topographic maps were obtained in four regions with an area of 15×15 µm2, allowing evaluation of the process stability and reproducibility. The inset in the figure presents the profile of individual lines, demonstrating good agreement with the design parameters.
The obtained results demonstrate the high potential of stamp-based electron-beam nanolithography for the fabrication of complex aperiodic structures, opening up new opportunities in the design of diffractive optical elements and photonic metasurfaces. This technology contributes to the further advancement of telecommunication systems, biomedical diagnostics, quantum devices, and next-generation X-ray optics.
This work was carried out as part of the State Assignment of the P. N. Lebedev Physical Institute. The development of AFM methods (A. I. Arhzanov, led by A. V. Naumov) was supported of the state assignment of Moscow State Pedagogical University (theme No. 124031100005-5). The development of X-ray optics (A. O. Kolesnikov, A. N. Shatokhin, E. N. Ragozin) was supported by a grant from the Russian Science Foundation (No. 25-12-00314, “Development and Study of New Optical Elements for the Soft X-Ray Spectral Range (5–25 nm)” led by E. N. Ragozin).
REFERENCES
Soifer V. A. Diffractive nanophotonics and advanced information technologies. Herald of the Russian Academy of Sciences. 2014; 84(1):9–20. DOI: 10.1134/S1019331614010067
Eremchev I. Y., Prokopova D. V., Losevskii N. N., Mynzhasarov I. T., Kotova S. P., Naumov A. V. Three-dimensional fluorescence nanoscopy of single quantum emitters based on the optics of spiral light beams. Physics-Uspekhi. 2022;65(6):617–626. DOI: 10.3367/UFNe.2021.05.038982
Ragozin E. N., Vishnyakov E. A., Kolesnikov A. O., Pirozhkov A. S., Shatokhin A. N. Soft X-ray spectrometers based on aperiodic reflection gratings and their application. Physics-Uspekhi. 2021; 64 495–514. DOI: 10.3367/UFNr.2020.06.038799
Kovalets N. P., Kozhina E. P., Razumovskaya I. V., Arzhanov A. I., Naumov А. V. Scratching of metallized polymer films by vickers indenter as a method for controlled production of sers-active metasurfaces. Journal of Luminescence. 2024; 275:120803. DOI: 10.1016/j.jlumin.2024.120803
Vyalykh A. P., Skakunenko P. I., Shishova M. V., Semenko A. V., Afanasiev A. E., Belotelov G. S., Sutyrin D. V., Balykin V. I. Atom Chip and Diffraction Grating for the Laser Cooling of Ytterbium Atoms. JETP Letters, 119 (4), 285-293 (2024). DOI: 10.1134/S0021364023604189.
Kotova S. P., Losevsky N. N., Mayorova A. M., Samagin S. A. Optothermal traps based on sector diffraction optical elements. Bulletin of the Russian Academy of Sciences: Physics. 87 (12), 1767-1772 (2023). DOI: 10.1134/s1062873823704038
Kazakov I. A., Malakhov K. M., Kovalev E. E., Mkrtchyan A. A., Mishevsky M. S., Svetikov V. V., Shipulin A. V. Study of operational algorithm for interrogator with arrayed waveguide grating on a photonic integrated circuit. Photonics Russia 18 (2) 122-135 (2024). DOI: 10.22184/1993-7296.FRos.2024.18.2.122.135
AUTHORS
A. I. Arzhanov, ORCID: 0000-0001-9305-067X
A. S. Shelkovnikov, ORCID: 0000-0003-3391-2738
A. O. Kolesnikov, ORCID: 0000-0003-2511-762X
A. N. Shatokhin, ORCID: 0000-0002-6057-3535
E. N. Ragozin, ORCID: 0000-0001-5912-9229
A. V. Naumov, e-mail: a_v_naumov@mail.ru; Home page: www.single-molecule.ru
ORCID: 0000-0001-7938-9802
as a Tool for Fabricating
Aperiodic Diffraction Gratings
for X-ray Optics
A. I. Arzhanov 1, 2, A. S. Shelkovnikov 1, V. V. Shulga 1, K. E. Aleksashin 1, A. O. Kolesnikov 1, A. N. Shatokhin 1, E. N. Ragozin 1, A. V. Naumov 1, 2
P. N. Lebedev Physical Institute of the Russian Academy of Sciences, Moscow, Troitsk, Russia
Moscow Pedagogical State University (MPGU), Moscow, Russia
The results of fabrication and characterization of metallized aperiodic diffraction gratings (with a line density ranging from 150 to 570 lines per mm) using modernized scanning stamp electron-beam nanolithography machine ZBA‑21 with a 200 nm process technological standard and a working area of up to 150 × 150 mm are presented. The characterization was performed using scanning atomic force microscopy.
Кeywords: Diffractive optics, X-ray optics, stamp electron-beam nanolithography, aperiodic diffraction gratings
Article received: 16.06.2025
Article accepted: 22.06.2025
Diffractive optics (DO) is one of the key areas of modern photonics, studying light control through micro- and nanostructures that induce diffraction. DO enables the creation of compact and highly efficient optical elements such as zone plates, holograms, and metasurfaces, which surpass traditional refractive optics. These technologies are applied in microscopy, lithography, laser systems, and optical communications. Of particular interest are metamaterials that showcasing unique effects, such as negative refraction [1]. The most important applications of DO include spectroscopy, microscopy, adaptive technologies, holographic elements, imaging systems, and X-ray optics [2].
One of the most in-demand applications of DO remains the production of diffraction gratings, especially in the context of emerging methods for designing diffractive optical elements and expanding the technology to various spectral ranges. Particularly important is the X-ray range, which requires the fabrication of grazing-incidence optics, including those based on aperiodic diffraction gratings [3].
Electron-beam nanolithography can be a highly efficient method for creating such diffractive elements [4].
In this note, we demonstrate a synthesized diffraction grating with potential applications in X-ray optics. The sample consists of a 5×5‑inch glass plate coated with a 160 nm chromium layer. At the center of the plate is the working area of a VLS grating (varied line space grating) for a soft x-ray monochromator (90–200 Å), mesauring 60 mm (width) × 10 mm (height). The line density ranges from 150 to 570 lines/mm, and the variation along the grating’s aperture is determined by a specific rule. The grating was fabricated using a ZBA‑21 electron-beam nanolithography system, which enables the creation of structures with a 200 nm process standard on surfaces up to 178×178 mm in size. Currently, this system is undergoing modernization at the Troitsk Branch of the P. N. Lebedev Physical Institute. A distinctive feature of this hardware complex is its stamp-based electron-beam formation method and high-precision alignment of individual elements of the lithographed structure, achieved using advanced laser interferometry techniques.
After exposure to the electron beam, the resist was developed, the underlying chromium layer was etched, the residual resist was removed, and the final product was cleaned. The total number of lines in the grating exceeds 19,000, with a smoothly varying period along the long side of the sample.
The initial characterization of the fabricated grating was performed at the Laboratory of Advanced Materials and Nanostructures Physics, Moscow State Pedagogical University, using an NTegra atomic force microscope (manufactured by Active Photonics, Russia), providing spatial resolution on the order of a few nanometers [4]. Figure 1 shows fragments of the topography of the lithographically fabricated VLS grating. Topographic maps were obtained in four regions with an area of 15×15 µm2, allowing evaluation of the process stability and reproducibility. The inset in the figure presents the profile of individual lines, demonstrating good agreement with the design parameters.
The obtained results demonstrate the high potential of stamp-based electron-beam nanolithography for the fabrication of complex aperiodic structures, opening up new opportunities in the design of diffractive optical elements and photonic metasurfaces. This technology contributes to the further advancement of telecommunication systems, biomedical diagnostics, quantum devices, and next-generation X-ray optics.
This work was carried out as part of the State Assignment of the P. N. Lebedev Physical Institute. The development of AFM methods (A. I. Arhzanov, led by A. V. Naumov) was supported of the state assignment of Moscow State Pedagogical University (theme No. 124031100005-5). The development of X-ray optics (A. O. Kolesnikov, A. N. Shatokhin, E. N. Ragozin) was supported by a grant from the Russian Science Foundation (No. 25-12-00314, “Development and Study of New Optical Elements for the Soft X-Ray Spectral Range (5–25 nm)” led by E. N. Ragozin).
REFERENCES
Soifer V. A. Diffractive nanophotonics and advanced information technologies. Herald of the Russian Academy of Sciences. 2014; 84(1):9–20. DOI: 10.1134/S1019331614010067
Eremchev I. Y., Prokopova D. V., Losevskii N. N., Mynzhasarov I. T., Kotova S. P., Naumov A. V. Three-dimensional fluorescence nanoscopy of single quantum emitters based on the optics of spiral light beams. Physics-Uspekhi. 2022;65(6):617–626. DOI: 10.3367/UFNe.2021.05.038982
Ragozin E. N., Vishnyakov E. A., Kolesnikov A. O., Pirozhkov A. S., Shatokhin A. N. Soft X-ray spectrometers based on aperiodic reflection gratings and their application. Physics-Uspekhi. 2021; 64 495–514. DOI: 10.3367/UFNr.2020.06.038799
Kovalets N. P., Kozhina E. P., Razumovskaya I. V., Arzhanov A. I., Naumov А. V. Scratching of metallized polymer films by vickers indenter as a method for controlled production of sers-active metasurfaces. Journal of Luminescence. 2024; 275:120803. DOI: 10.1016/j.jlumin.2024.120803
Vyalykh A. P., Skakunenko P. I., Shishova M. V., Semenko A. V., Afanasiev A. E., Belotelov G. S., Sutyrin D. V., Balykin V. I. Atom Chip and Diffraction Grating for the Laser Cooling of Ytterbium Atoms. JETP Letters, 119 (4), 285-293 (2024). DOI: 10.1134/S0021364023604189.
Kotova S. P., Losevsky N. N., Mayorova A. M., Samagin S. A. Optothermal traps based on sector diffraction optical elements. Bulletin of the Russian Academy of Sciences: Physics. 87 (12), 1767-1772 (2023). DOI: 10.1134/s1062873823704038
Kazakov I. A., Malakhov K. M., Kovalev E. E., Mkrtchyan A. A., Mishevsky M. S., Svetikov V. V., Shipulin A. V. Study of operational algorithm for interrogator with arrayed waveguide grating on a photonic integrated circuit. Photonics Russia 18 (2) 122-135 (2024). DOI: 10.22184/1993-7296.FRos.2024.18.2.122.135
AUTHORS
A. I. Arzhanov, ORCID: 0000-0001-9305-067X
A. S. Shelkovnikov, ORCID: 0000-0003-3391-2738
A. O. Kolesnikov, ORCID: 0000-0003-2511-762X
A. N. Shatokhin, ORCID: 0000-0002-6057-3535
E. N. Ragozin, ORCID: 0000-0001-5912-9229
A. V. Naumov, e-mail: a_v_naumov@mail.ru; Home page: www.single-molecule.ru
ORCID: 0000-0001-7938-9802
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